Lecture 30 (CHE 323) Chemical Mechanical Polishing (CMP)
17:24
Lecture 31 (CHE 323) Copper Dual Damascene
8:44
Chemical Mechanical Planarization, CMP Process Fundamentals: Sec 4 - CMP Polishing Pads
16:40
Chemical Mechanical Planarization, CMP Process Fundamentals: Sec. 5 & 6 - CMP Challenges & Summary
18:16
Lecture 1 (CHE 323) Semiconductor Overview
3:55
Introduction to Chemical Mechanical Planarization/Polishing (CMP) in Semiconductor Fabrication
15:22
Lecture 22 (CHE 323) Sputtering, part 1
11:41
Chemical Mechanical Planarization, CMP Process Fundamentals: Sec 3 - CMP Slurries
16:53